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Mechanical and tribological properties of a-C:H:F Thin Films
(2013-07-01)
a-C:H films were grown by plasma-enhanced chemical vapor deposition in atmospheres composed by 30 % of acetylene and 70 % of argon. Radiofrequency signal (RF) was supplied to the sample holder to generate the depositing ...
Mechanical and tribological properties of a-C:H:F Thin Films
(2013-07-01)
a-C:H films were grown by plasma-enhanced chemical vapor deposition in atmospheres composed by 30 % of acetylene and 70 % of argon. Radiofrequency signal (RF) was supplied to the sample holder to generate the depositing ...
Role of the reactive sputtering deposition power in the phase control of cobalt oxide films
(A V S Amer Inst Physics, 2018-11-01)
The influence of the reactive magnetron sputtering deposition power on determining the stoichiometry and structure of cobalt oxide polycrystalline films is investigated using experimental and simulated data. Direct current ...
Influence of Laser Beam Power and Scanning Speed on the Macrostructural Characteristics of AISI 316L and AISI 431 Stainless Steel Depositions Produced by Laser Cladding Process
(2021-01-01)
In the laser cladding process, control of the process parameters and knowledge of the characteristics of the materials used are essential for obtaining depositions with excellent metallurgical union, satisfactory dilution ...
Estimation of erosion and deposition by Unit Stream Power Erosion and Deposition in a sub-basin on the Mogi Guaçu River’s margins, municipality of Mogi Guaçu, SP, BrazilEstimativa da erosão e deposição pela Unit Stream Power Erosion and Deposition em uma sub-bacia às margens do Rio Mogi Guaçu, município de Mogi Guaçu, São Paulo, Brasil
(Universidade de São Paulo, Instituto de Geociências, 2022)
Improved effective charge density in MOS capacitors with PECVD SiOxNy dielectric layer obtained at low RF power
(ELSEVIER SCIENCE BV, 2008)
In this work SiOxNy films are produced and characterized. Series of samples were deposited by the plasma enhanced chemical vapor deposition (PECVD) technique at low temperatures from silane (SiH4), nitrous oxide (N2O) and ...
The β to α phase transition of tantalum coatings deposited by modulated pulsed power magnetron sputtering
(Lausanne, 2014-02-24)
Tantalum coatings are of particular interest today as promising candidates to replace potentially hazardous electrodeposited chromium coatings for tribological and corrosion resistant applications, such as the internal ...
Organosilicon films deposited in low-pressure plasma from hexamethyldisiloxane — A review
(2021-12-01)
We present a review of low-pressure plasma-enhanced chemical vapor deposition (PECVD) with the hexamethyldisiloxane (HMDSO) precursor for production of organosilicon thin films. This topic has been the subject of numerous ...